Precision ion polishing system for precise centering, control, and reproducibility of your milling process.

Advantages

• X,Y stage permits alignment of argon beams to region of interest on the sample
• Improved collimated beam provides useable voltages as low as 100 volts for rapid and damage free preparation of FIB lamella
• Digital optical imaging with image storage and analysis in DigitalMicrograph® software
• 10" color touch screen for display and control of all PIPS™ II parameters